Various simultaneous combinations of these three cases cannot be excluded. Figure 3 C1 s XPS spectrum of the type II sample. The thick curve is the original data. The thin curves are the fitting peaks on 282.8, 284.4, 285.5, and 287.8 eV. The summary fitting see more curve almost completely matches the experimental curve. The fitting of experimental angular dependences

Ψ(φ 0), Δ(φ 0) for the initially oxidized silicon substrate in terms of two-parameter IUTL-model produced a sufficiently small value of the error function (MSEmin = 0.1434) for the values of variable parameters n = 1.460, h = 135.7 nm (the values of the optical constants of the silicon substrate here and in the rest of the calculations HDAC inhibitor mechanism are n s = 3.865, k s = 0.023). In terms of IUTL-model, n and h can, in fact, be calculated from the values of Ψ and Δ measured at any given φ 0. Values of n and h obtained this way fluctuate randomly in the ranges of 1.459–1.461 and 135.5 nm – 135.8 nm when φ 0 changes from 45° to 75°. In this case, the absence of clear dependence of n and h from φ 0 suggests

the IUTL model’s adequacy as a necessary condition had been met. Minimization of MSE in terms of the three-parametric single-layer models that allow individual evaluation of the absorption, anisotropy, and refractive index vertical non-uniformity does not decrease the value of Selleckchem HSP990 MSEmin – these models, in fact, get reduced to IUTL model: This should be considered as sufficient condition for IUTL-model adequacy. Thus, the oxide film obtained by oxidation of silicon on air is isotropic, uniform, and transparent. We emphasize that the n = 1.460 value corresponds to the refractive index value for SiO2 thermal oxide films. Carrying out the graphite sublimation process leads to considerable changes of the Ψ - Δ values. These changes are accompanied

by the decrease in adequacy of the IUTL model – there is observed monotonic increases of n(φ 0) values Galeterone from 1.457 to 1.466 and decrease of h(φ 0) values from 151.7 to 150.4 nm as φ 0 increases from 45° to 75°. This decrease in adequacy is also confirmed by computation of the MSEmin in the terms of IUTL-model – the MSEmin value increases by an order of magnitude: As it can be seen within the framework of the IUTL-model, there is little change of n value, yet there is substantial increase of h value. This result shows that as far as the sample’s optical properties are concerned, the most substantial result of carrying out the graphite sublimation process has been the thickening of the oxide film. The reasons of the decrease in IUTL model adequacy can, in first approximation, be evaluated through solving of ITE in terms of three-parametric single-layer models.